Innovation Type - Production technology of metal-semiconductor nanocomposites through fulfilling with metal the pores of a semiconductor porous template

Potential beneficiaries - Producers of integrated optoelectronic and photonic circuits

SUMMARY / SPECIAL CHARACTERISTICS

Basically there are 2 methods to produce metal-dielectric nanocomposites.
One of the methods is based on injection under pressure of a melted metal in vacuum in the pores of a metal porous. The disadvantage of this method is the expensive equipment and a very high temperature that can lead to undesirable change of the properties porous material.
The second method to produce the metal-dielectric nanocomposite is based on fulfilling electrochemically with metal the pores of a porous template made of aluminum oxide. In this case the disadvantage is based on low efficiency of pores fulfilling when using a semiconductor porous template.
The newly designed technology successfully deals with previously registered weaknesses through the chemical deposit of metals into the pores of a semiconductor porous template with a sensitized and catalytically activated surface in an ultrasonic field. As a semiconductor template one can use n-InP nonporous layers of 40 ¡V 45 ƒİm, produced through the electrochemical corrosion of n-InP sub-layers while forming a net of hexagonal bi-dimensional pores.
The new part of the suggested technology consists of sensitization and catalytic activation in an ultrasonic field. If sensitization and activation are done without an ultrasonic field, the metal cannot flow inside pores. However, when activating the surface of InP nanotemplate in an ultrasonic filed, copper can efficiently get inside pores to form InP-Cu nanocomposites through fulfilling well and uniformly templates¡¦ pores.

ADVANTAGES

• Applying technologies of chemical and electrochemical metals deposit in both dielectric templates and semiconductors;
• Using cheap equipment;
• Preserving the intact properties of the porous material.

Current stage of development - Lab testing

Where was applied - Technical University of Moldova

Desired collaboration - Partnerships